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Characterization of Amorphous Silicon Thin Films Deposited on Upilex-s Polyimide Substrates for Application in Flexible Solar Cells

关键字:Upilex-s polyimide; amorphous silicon thin film; characterization; flexible solar cells
摘要:Upilex-s [poly(biphenyl dianhydride-p-phenylene diamine)] polyimide have been widely employed in the area of flexible electronics. For its potential application on fabricating flexible solar cells, the optical properties of Upilex-s are measured in this paper. Intrinsic hydrogenated amorphous silicon layers are then deposited on Upilex-s substrates at temperatures 100 degrees C and 180 degrees C by plasma enhanced chemical vapor deposition (PECVD) system. As an comparison, intrinsic a-Si:H layers are also fabricated on glass substrate of Corning(2000). Both layers on flexible and rigid substrates are thoroughly characterized by activation energy and dark conductivity measurements. It can be concluded that the intrinsic layer on Upilex-s has favorable properties and could be a competitive candidate as substrate materials of flexible solar cells.
卷号:87-88
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李莺歌

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