谢广文   Professor

谢广文，教授，博士，长期从事纳米材料、微晶与非晶态材料研究与应用，在纳米材料表面改性、非晶态催化材料等领域取得了许多创新性成果。近年来在《燃料化学学报》、Chemical Engineering Journal、Carbon、Green Energy & Environment、Journal of Materials Chemistry A、Applied Surface Science、 ACS Applied Materials & Interfaces、Journal of Power Sources、Renewable Energy、Surface and Coatings Technolo...Detials

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等离子体化学气相沉积TiN涂层的后热处理技术研究

Release time:2021-03-15  Hits:

  • Key Words:TiN涂层;;等离子体化学气相沉积;;后热处理
  • Abstract:为了提高等离子体化学气相沉积 (PCVD)涂层的质量 ,改善基体材料的机械性能 ,更好地发挥PCVD硬质涂层的使用效果 ,采用了先沉积后热处理的新工艺。结果表明 ,热处理温度对PCVD TiN涂层的化学成分、显微结构和性能有较大的影响。随着处理温度的提高 ,涂层的结晶度得到大幅度的改善 ,涂层内的杂质氯含量降低 ,涂层的 (2 0 0 )晶面距减小 ,但在 90 0℃时 ,PCVD TiN涂层的显微硬度有一个最低值
  • Issue:05
  • Translation or Not:no
Pre One: 负载型非晶合金催化剂Ni-Co-P/γ-Al_2O_3催化硼氢化钠水解制氢
Next One: 高分子材料表面化学镀银工艺的研究

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