谢广文   Professor

谢广文,教授,博士,长期从事纳米材料、微晶与非晶态材料研究与应用,在纳米材料表面改性、非晶态催化材料等领域取得了许多创新性成果。近年来在《燃料化学学报》、Chemical Engineering Journal、Carbon、Green Energy & Environment、Journal of Materials Chemistry A、Applied Surface Science、 ACS Applied Materials & Interfaces、Journal of Power Sources、Renewable Energy、Surface and Coatings Technolo...Detials

Annealing studies of TiN films deposited by plasma-assisted CVD

Release time:2023-10-19  Hits:

  • Key Words:plasma-assisted CVD; TiN film; annealing treatment
  • Abstract:Titanium nitride films prepared by plasma-assisted chemical vapor deposition (PACVD) on high speed steel were heated in the range of 1073-1373 It. The samples were analyzed by microhardness, XRD, EDX, SEM and XPS. It was found that the annealing temperatures had significant effects on the composition, microstructure and mechanical properties of the films. The chlorine content and lattice parameters of the films were reduced with the rise of the annealing temperature. The microhardness of the films had a minimal value at the annealing temperature of 1173 K. These results were interpreted in terms of the changes of microstructures of the PACVD TiN films. (C) 2001 Elsevier Science B.V. All rights reserved.
  • Volume:138
  • Issue:2-3
  • Translation or Not:no